IC Front-End /Mask/EDA
Taiwan
China
Active vibration isolation system
Air Leaker/temp monitor system
Bulk Chemical (H2O2/H2SO4/NH4OH/HCL/HNO3)
Chemical Air filter for Facility (FFU/MAU) and Equipment (Scanner/ Stepper/ Track and other more process tool)
Chemical Filter (Process Tool / MAU / FFU)
Chiller: ESL-60TV, DEX-20A, DEX-25AZ, ESH-30A, EN-30, AX-2020C, MP-45BG
Cleaner tool / ECP plating tool
CMP Asahi Diamond Conditioner
CMP PVA BRUSH / PVA WIPER
Consumables for optical components (lens、filters、cover glass、seal glass etc) laser refurbishing
Defect off line auto-classification, defect printing simulation, defect tracing
developer、etcher、resist coater、baking system、pellicle remover system
Digital photomask writer (FPD, LSI), Registration tool (HPS)
EBR7030,Cyclohexanone,Cyclopentanone(PI Develop)
EUV reflectometer、EUV Pellicle transmission tool、EUV mask exposure tool、Resist outgassing measurement tool
Filters and contamination control components
Flatness interferometric measuring machine (BOW、WARP、SORI、TTV)
Fore-line Plasma Pre-treatment System
Hight brightness halogen light source
Implanter for III/V compound Semiconductor
Layout Editor and Browser Tools Apply in IC and FPD Design Areas,RC Extraction and IR Dropanalysis Tools
Mask CD measurement tool & wafer mini stepper
Mask Defect Management System
We use cookies to improve your user experience and for web traffic statistics
purposes. By continuing to use this website, you agree to our use of cookies. Our
Privacy & Cookie Policy contains more information on such use and explains how to
disable cookies.
Agree
Oops, your web browser Javascript is not enabled.
Please enable Javascript in your browser.