IC Front-End /Mask/EDA

台湾 中国

Mask pattern generator、Mask inspection、Mask repair、Mask CD measurement Aligner、Stepper、Wafer CD Inspection

Mask Process Chemical, Develop, Rinse、Clean, Cr-Etchant, Photoresist Stripper, Waferbond Remover, BOE Etchant, ACC, ACETIC CU CLEAN, HMDS

Metron 3D / RPM 3D metrology tool

MFC 氣體流量計 Mass Flow Controller

Nanoscale Liquid Inspection

O-Ring

Overlay measurement tool/ TSV front-end overlay

parts for mask etching tool

Photomask CD-SEM

Photomask E-Beam Writer service

PR stripper、polymer cleaners

Pressure sensor

Protection gate valve

Pump

SiC /GaN/GaAs Grinding polishing tool

SiC dummy wafer / SiC plate

SLURRY/PAD

Solvent、Water filter

TASS Unit : A seismic isolation system

TDMAS / TDMAH, High-K precursor, TiW/Cu etching solution (WL-CSP)

TGS Series : A seismic isolation system for semiconductor equipment

Thermocouple/Precious metal Target

Wafer Inspection (edge & backside)

Wafer ultra shallow junction inspection.

元器件

清潔軟管、接頭

臭氧水產生器模組在清、臭氧氣體產生器在沉積的應用

臭氧發生器