半導體前段/光罩/EDA

台灣 中國

Active vibration isolation system

Air Leaker/temp monitor system

Bulk Chemical (H2O2/H2SO4/NH4OH/HCL/HNO3)

Chemical Air filter for Facility (FFU/MAU) and Equipment (Scanner/ Stepper/ Track and other more process tool)

Chemical Filter (Process Tool / MAU / FFU)

Chiller: ESL-60TV, DEX-20A, DEX-25AZ, ESH-30A, EN-30, AX-2020C, MP-45BG

Clean wiper

Cleaner tool / ECP plating tool

CMP Asahi Diamond Conditioner

CMP pad Conditioner

CMP PVA BRUSH / PVA WIPER

Consumables for optical components (lens、filters、cover glass、seal glass etc) laser refurbishing

CuSO4 Solution

Defect off line auto-classification, defect printing simulation, defect tracing

developer、etcher、resist coater、baking system、pellicle remover system

Digital photomask writer (FPD, LSI), Registration tool (HPS)

DUPRA O-RING全氟橡膠圈

EBR7030,Cyclohexanone,Cyclopentanone(PI Develop)

Etcher (MRAM)

EUV reflectometer、EUV Pellicle transmission tool、EUV mask exposure tool、Resist outgassing measurement tool

Filters and contamination control components

Flatness interferometric measuring machine (BOW、WARP、SORI、TTV)

Fore-line Plasma Pre-treatment System

Ga2O3 wafers

H3PO4

Hight brightness halogen light source

Implanter for III/V compound Semiconductor

Ion Implanter

Layout Editor and Browser Tools Apply in IC and FPD Design Areas,RC Extraction and IR Dropanalysis Tools

Local Scrubber

Mask CD measurement tool & wafer mini stepper

Mask Defect Management System